Method of optically transferring a pattern from a mask...

Details Method of optically transferring a pattern from a mask... Method of optically transferring a pattern from a mask...

2004-08-20

2009-08-18

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000

Reexamination Certificate

active

07575852

ABSTRACT:
An oriented assist feature is described that permits transferring of a lithographic pattern corresponding to an integrated circuit from a mask onto a semiconductor substrate. The oriented assist feature does not exhibit a forbidden pitch phenomenon, thereby providing a wide photo process window for a hole pattern.

REFERENCES:
patent: 5725969 (1998-03-01), Lee
patent: 6905899 (2005-06-01), Yang
patent: 2002/0045106 (2002-04-01), Baselmans et al.
patent: 2004/0009409 (2004-01-01), Hwang et al.
patent: 2004/0038135 (2004-02-01), Griesinger et al.
patent: 2004/0111693 (2004-06-01), Lin et al.
patent: 2005/0076321 (2005-04-01), Smith

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