Chemically amplified resist composition

Details Chemically amplified resist composition Chemically amplified resist composition

2008-01-28

2009-08-18

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S910000, C430S921000, C430S922000

Reexamination Certificate

active

07575850

ABSTRACT:
The present invention provides a chemically amplified resist composition comprising:a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I):wherein R1represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, andat least two salts selected from a salt represented by the formula (II):wherein Y1and Y2each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+represents an organic counter ion and R21represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— or —O—, and a salt represented by the formula (III):in-line-formulae description="In-line Formulae" end="lead"?A′+−O3S—R23  (III)in-line-formulae description="In-line Formulae" end="tail"?wherein R23represents a C1-C8 linear or branched chain perfluoroalkyl group and A′+represents an organic counter ion.

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