Mask with hydrophobic surface

Details Mask with hydrophobic surface Mask with hydrophobic surface

2007-03-13

2009-12-22

Picardat, Kevin M (Department: 2822)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S787000, C438S945000, C148SDIG010

Reexamination Certificate

active

07635652

ABSTRACT:
A mask with hydrophobic surface. The mask includes a substrate, a plurality of patterns formed on the substrate, and a self-assembled monolayer (SAM) formed on the substrate exposed by the patterns. The self-assembled monolayer includes an alkyltrichlorosilane-based layer such as octadecyltrichlorosilane (OTS) or perfluorodecyltrichlorosilane (FDTS) and formed by vapor process or solution process.

REFERENCES:
patent: 2004/0241896 (2004-12-01), Zhou et al.
patent: 2006/0057851 (2006-03-01), Wong et al.
patent: 2006/0257751 (2006-11-01), Eggers et al.

Affiliated with

Also associated with

Rating

Mask with hydrophobic surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask with hydrophobic surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask with hydrophobic surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4082421