Fluorine-containing silicon compounds, silicone resins,...

Details Fluorine-containing silicon compounds, silicone resins,... Fluorine-containing silicon compounds, silicone resins,...

2007-03-05

2009-02-03

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S907000, C430S905000, C430S325000, C430S326000, C430S330000, C556S400000, C556S437000, C556S438000, C556S441000, C528S010000, C528S040000, C528S042000

Reexamination Certificate

active

07485408

ABSTRACT:
Fluorine-containing silicon compounds having the general formula (1):wherein X1, X2, and X3each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, Y is a divalent organic group, R1and R2are each independently hydrogen or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or R1and R2may bond together to form a ring with the carbon atom to which they are attached silicone resins obtained from the compounds of formula (1) has an appropriate acidity to enable formation of a finer pattern while minimizing the pattern collapse by swelling when used in a resist composition.

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