Positive photosensitive composition, polymer compounds for...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S326000, C430S905000, C430S910000, C526S082000, C526S085000, C526S281000, C526S284000, C560S015000

Reexamination Certificate

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07629107

ABSTRACT:
A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.

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patent: 2005085301 (2005-09-01), None
European Office Action 07018182.1-1226 dated Feb. 15, 2008.
Idriss Blakey, et al “Synthesis of high refractive index sulfur containing polymers for 193nm immersion lithography” Pro SPIE Int Soc Opt Eng, vol. 6153, No. 1, Feb. 2006 pp. 61530H1-61530H10, XP002465914.

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