Optics: measuring and testing – Inspection of flaws or impurities
Patent
1997-09-19
1999-05-25
Font, Frank G.
Optics: measuring and testing
Inspection of flaws or impurities
3562391, 3562397, 3562398, G01N 2100
Patent
active
059073969
ABSTRACT:
An optical detection system capable of detecting even small particles or defects on a specimen such as a mask with high sensitivity and being unaffected by diffracted light from the edges of the pattern even when inspecting a thick specimen. The optical detection system includes a light emission means for illuminating a pattern surface on the specimen with light, a first light reception optical system placed on the pattern surface side of the specimen for receiving scattered light emanating from the pattern surface, a second light reception optical system placed on the glass side of the specimen in symmetry with the first light reception optical system relative to the pattern surface for receiving scattered light emanating from the pattern surface through the specimen and a corrective optical element for correcting for differences in the aberration states of the first and second light reception optical systems.
REFERENCES:
patent: 3814946 (1974-06-01), Takahashi et al.
patent: 3879131 (1975-04-01), Cuthbert et al.
patent: 4468120 (1984-08-01), Tanimoto et al.
patent: 4672196 (1987-06-01), Canino
Hagiwara Tsuneyuki
Komatsu Koichiro
Tashiro Hideyuki
Font Frank G.
Meller Michael N.
Nikon Corporation
Stafira Michael P.
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