Method and equipment for detecting pattern defect

Optics: measuring and testing – By polarized light examination – Of surface reflection

Reexamination Certificate

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C356S364000

Reexamination Certificate

active

07456963

ABSTRACT:
An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.

REFERENCES:
patent: 5264700 (1993-11-01), Tommasini et al.
patent: 5264912 (1993-11-01), Vaught et al.
patent: 5331169 (1994-07-01), Tanaka et al.
patent: 5486919 (1996-01-01), Tsuji et al.
patent: 5625193 (1997-04-01), Broude et al.
patent: 5774222 (1998-06-01), Maeda et al.
patent: 6040909 (2000-03-01), Hasegawa et al.
patent: 6256087 (2001-07-01), Bader
patent: 6369888 (2002-04-01), Karpol et al.
patent: 56-62219 (1981-05-01), None
patent: 62-90615 (1987-04-01), None
patent: 62-109019 (1987-05-01), None
patent: 5-289014 (1993-11-01), None
patent: 6-102462 (1994-04-01), None
patent: 11-218991 (1999-08-01), None

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