Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-09-28
2008-12-02
Ghyka, Alexander G (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C427S252000
Reexamination Certificate
active
07459395
ABSTRACT:
A method of purifying a metal carbonyl precursor in a metal precursor vaporization system where the metal carbonyl precursor comprises a metal particulate impurity. The method includes flowing a CO-containing gas through the metal precursor vaporization system to a precursor collection system in fluid communication with the metal precursor vaporization system to separate the metal carbonyl precursor from the metal particulate impurity and to transfer the metal carbonyl precursor to the precursor collection system, and collecting the transferred metal carbonyl precursor in the precursor collection system, where an amount of the metal particulate impurity is lower in the precursor collection system than in the precursor vaporization system and the precursor collection system is maintained at a lower temperature than the metal precursor vaporization system. A metal carbonyl precursor parameter may be monitored to determine a status of the metal carbonyl precursor and the need for purifying the metal carbonyl precursor.
REFERENCES:
patent: 5108983 (1992-04-01), Lackey, Jr. et al.
patent: 5312509 (1994-05-01), Eschbach
patent: 5553395 (1996-09-01), Wen et al.
patent: 5904771 (1999-05-01), Tasaki et al.
patent: 5914001 (1999-06-01), Hansen
patent: 6303809 (2001-10-01), Chi et al.
patent: 6319832 (2001-11-01), Uhlenbrock et al.
patent: 6428623 (2002-08-01), Westmoreland et al.
patent: 6440495 (2002-08-01), Wade et al.
patent: 6444263 (2002-09-01), Paranjpe et al.
patent: 6544345 (2003-04-01), Mayer et al.
patent: 6605735 (2003-08-01), Kawano et al.
patent: 6660328 (2003-12-01), Dahmen et al.
patent: 6701066 (2004-03-01), Sandhu
patent: 6713373 (2004-03-01), Omstead
patent: 6718126 (2004-04-01), Lei
patent: 6740586 (2004-05-01), Wang et al.
patent: 7297719 (2007-11-01), Suzuki
patent: 2003/0129306 (2003-07-01), Wade et al.
patent: 2004/0013577 (2004-01-01), Ganguli et al.
patent: 2004/0105934 (2004-06-01), Chang et al.
patent: 2004/0241321 (2004-12-01), Ganguli et al.
patent: 2005/0081882 (2005-04-01), Greer et al.
patent: 2005/0110142 (2005-05-01), Lane et al.
patent: 2005/0186341 (2005-08-01), Hendrix et al.
patent: 2006/0068098 (2006-03-01), Yamasaki et al.
patent: 2006/0224008 (2006-10-01), Suzuki et al.
patent: 0620291 (1994-10-01), None
patent: 0 714 999 (1996-06-01), None
patent: WO 0026432 (2000-05-01), None
patent: WO 2004/010463 (2004-01-01), None
patent: WO 2005034223 (2005-04-01), None
European Patent Office, International Search Report and Written Opinion of corresponding PCT Application No. PCT/US2006/007675, dated Oct. 13, 2006, 9 pages.
Ghyka Alexander G
Patel Reema
Tokyo Electron Limited
Wood Herron & Evans LLP
LandOfFree
Method for purifying a metal carbonyl precursor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for purifying a metal carbonyl precursor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for purifying a metal carbonyl precursor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4026427