Charged particle beam irradiation method, method of...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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C250S492220, C382S149000

Reexamination Certificate

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07439503

ABSTRACT:
A charged particle beam irradiation method includes: obtaining shape information of an edge of a pattern to be inspected that is formed on a subject; creating a first line group substantially perpendicular to the pattern edge; creating a second line group substantially parallel with the pattern edge; specifying areas defined by the first line group and the second line group as a lattice group including irradiation positions of a charged particle beam; deciding an order to irradiate the areas with the charged particle beam so that the lattice group is sequentially scanned in a direction of the first or second line group; and scanning the subject with the charged particle beam in accordance with the irradiation order.

REFERENCES:
patent: 5818217 (1998-10-01), Komatsu et al.
patent: 6573889 (2003-06-01), Georgiev
patent: 6868175 (2005-03-01), Yamamoto et al.
patent: 2005/0146714 (2005-07-01), Kitamura et al.
patent: 5-151921 (1993-06-01), None
Hideaki Abe, “Charged Particle Beam Apparatus, Charged Particle Beam Irradiation Method, and Method of Manufacturing Semiconductor Device”, U.S. Appl. No. 10/742,998, filed Dec. 23, 2003.

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