Micropattern measuring method, micropattern measuring...

Data processing: measuring – calibrating – or testing – Measurement system – Orientation or position

Reexamination Certificate

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Details

C702S158000

Reexamination Certificate

active

07418363

ABSTRACT:
A micropattern measuring method disclosed herein includes acquiring an image of a micropattern including plural layers; extracting a rough outline of the micropattern in the image as a sequence of points including plural points; dividing the plural points composing the sequence of points into groups; making each of the groups as each of patterns belong to any of the plural layers; and acquiring edge coordinates of a pattern to be measured from the patterns which are made to belong to the respective layers.

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Notification of Reason for Rejection issued by the Japanese Patent Office mailed Apr. 28, 2006, for Japanese Patent Application No. 2002-305460, and English-language translation thereof.

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