Data processing: measuring – calibrating – or testing – Measurement system – Orientation or position
Reexamination Certificate
2005-07-14
2008-08-26
Nghiem, Michael P (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system
Orientation or position
C702S158000
Reexamination Certificate
active
07418363
ABSTRACT:
A micropattern measuring method disclosed herein includes acquiring an image of a micropattern including plural layers; extracting a rough outline of the micropattern in the image as a sequence of points including plural points; dividing the plural points composing the sequence of points into groups; making each of the groups as each of patterns belong to any of the plural layers; and acquiring edge coordinates of a pattern to be measured from the patterns which are made to belong to the respective layers.
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Notification of Reason for Rejection issued by the Japanese Patent Office mailed Apr. 28, 2006, for Japanese Patent Application No. 2002-305460, and English-language translation thereof.
Ikeda Takahiro
Miyano Yumiko
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Nghiem Michael P
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