Non-volatile semiconductor memory and method for...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S315000, C257S321000, C257SE29129

Reexamination Certificate

active

07432561

ABSTRACT:
An non-volatile semiconductor memory having a linear arrangement of a plurality of memory cell transistors, includes: a first semiconductor layer having a first conductivity type; a second semiconductor layer provided on the first semiconductor layer to prevent diffusion of impurities from the first semiconductor layer to regions above the second semiconductor layer; and a third semiconductor layer provided on the second semiconductor layer, including a first source region having a second conductivity type, a first drain regions having the second conductivity type and a first channel region having the second conductivity type for each of the memory cell transistors.

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patent: 2006/0049449 (2006-03-01), Iino et al.
patent: 2007/0138576 (2007-06-01), Mizukami et al.
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patent: 2000-174241 (2000-06-01), None
U.S. Appl. No. 11/608,393, filed Dec. 8, 2006, Mizukami et al.
U.S. Appl. No. 11/616,522, filed Dec. 27, 2006, Arai et al.
U.S. Appl. No. 11/447,941, filed Jun. 7, 2006, Masayuki Ichige et al.
U.S. Appl. No. 11/563,073, filed Nov. 24,2006, Naohisa Iino et al.
U.S. Appl. No. 11/963,046, filed Dec. 21, 2007, Arai et al.
U.S. Appl. No. 11/549,770, filed Oct. 16, 2006, Shirota et al.
U.S. Appl. No. 11/608,393, filed Dec. 8, 2006, Mizukami et al.

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