Wafer structure with mirror shot

Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S798000

Reexamination Certificate

active

07414324

ABSTRACT:
A wafer structure with mirror shot is provided. A wafer structure according to the present invention comprises a first mirror shot area to which a mirror shot is applied, wherein the position of a first die is searched for based on the first mirror shot area. The wafer structure further comprises a second mirror shot area to which the mirror shot is applied. The second mirror shot area is located diagonally with respect to the first mirror shot area.

REFERENCES:
patent: 6015750 (2000-01-01), Bruce et al.
patent: 6180498 (2001-01-01), Geffken et al.
patent: 6501188 (2002-12-01), Stanton et al.
patent: 7067931 (2006-06-01), Leroux
patent: 11-067876 (1999-03-01), None
patent: 2002-026041 (2002-01-01), None
patent: 2002-312933 (2002-10-01), None
patent: 2005-093461 (2005-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Wafer structure with mirror shot does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer structure with mirror shot, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer structure with mirror shot will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4001451

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.