Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2004-06-09
2008-10-07
Wojciechowicz, Edward (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S347000, C257S401000, C257S628000
Reexamination Certificate
active
07432558
ABSTRACT:
A semiconductor device may include a substrate and an insulating layer formed on the substrate. A fin may be formed on the insulating layer. The fin may include a side surface and a top surface, and the side surface may have a <100> orientation. A first gate may be formed on the insulating layer proximate to the side surface of the fin.
REFERENCES:
patent: 5171703 (1992-12-01), Lin et al.
patent: 6867460 (2005-03-01), Anderson et al.
patent: 6870226 (2005-03-01), Maeda et al.
patent: 2004/0150029 (2004-08-01), Lee
patent: 2005/0121676 (2005-06-01), Fried et al.
patent: 2006/0255410 (2006-11-01), Bernstein et al.
patent: 2006/0292889 (2006-12-01), Blanchard et al.
Digh Hisamoto et al., “FinFET-A Self-Aligned Double-Gate MOSFET Scalable to 20 nm,” IEEE Transactions on Electron Devices, vol. 47, No. 12, Dec. 2000, pp. 2320-2325.
Yang-Kyu Choi et al., “Sub-20nm CMOS FinFET Technologies,” 2001 IEEE, IEDM, pp. 421-424.
Xuejue Huang et al., “Sub-50 nm P-Channel FinFET,” IEEE Transactions on Electron Devices, vol. 48, No. 5, May 2001, pp. 880-886.
Xuejue Huang et al., “Sub 50-nm FinFET: PMOS,” 1999 IEEE, IEDM, pp. 67-70.
Yang-Kyu Choi et al., “Nanoscale CMOS Spacer FinFET for the Terabit Era,” IEEE Electron Device Letters, vol. 23, No. 1, Jan. 2002, pp. 25-27.
Ahmed Shibly S.
An Judy Xilin
Dakshina-Murthy Srikanteswara
Tabery Cyrus E.
Yu Bin
Advanced Micro Devices , Inc.
Harrity & Snyder LLP
Wojciechowicz Edward
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