Systems and methods for detecting contaminants

Measuring and testing – Gas analysis

Reexamination Certificate

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C073S028010, C073S028040, C073S031020, C073S031030, C073S031050

Reexamination Certificate

active

07430893

ABSTRACT:
The present invention relates to a system and method for sampling a gas flow to measure one or more contaminants within a semiconductor processing tool. The system includes a portable unit containing one or more dry traps, Tenax traps and, if desired, wet impingers. The unit is coupled to a gas flow in a clean room and the dry traps. Tenax traps and wet impingers measure contaminants contained in the gas supply for a determined sampling interval. When the sampling interval is done, the unit is sent to an analysis facility for processing.

REFERENCES:
patent: 3881359 (1975-05-01), Culbertson
patent: 4686848 (1987-08-01), Casselberry et al.
patent: 5574230 (1996-11-01), Baugh
patent: 5856198 (1999-01-01), Joffe et al.
patent: 6085576 (2000-07-01), Sunshine et al.
patent: 6096267 (2000-08-01), Kishkovich et al.
patent: 6295864 (2001-10-01), You et al.
patent: 6422061 (2002-07-01), Sunshine et al.
patent: 6703241 (2004-03-01), Sunshine et al.
patent: 6779411 (2004-08-01), Spurgeon
patent: 2002/0178923 (2002-12-01), Kishkovich et al.
patent: 2003/0068834 (2003-04-01), Kishkovich et al.
patent: 2005/0045039 (2005-03-01), Shellhammer et al.

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