Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-01-10
2008-10-14
Jackson, Jr., Jerome (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257SE27104, C257SE29164
Reexamination Certificate
active
07436013
ABSTRACT:
A ferroelectric memory device has a high performance, includes no Pb, and can be directly mounted onto an Si substrate. The ferroelectric memory device includes a (001)-oriented BiFeO3ferroelectric layer5with a tetragonal structure, which is formed on an electrode4made of a perovskite material formed on an Si oxide film. The electrode4with a perovskite structure is formed by an ion beam assist method.
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Yun et al, “Prominent ferroelectricity of BiFeO3 . . . deposition”, Applied Physics Letters vol. 83, No. 19 Nov. 10, 2003 pp. 3981-3983.
Wang et al., “Epitaxial BiFeO3Multiferroic Thin Film Heterostructures,” Science, vol. 299, pp. 1719-1722, Mar. 14, 2003.
Higuchi Takamitsu
Iwashita Setsuya
Miyazawa Hiromu
Jackson, Jr. Jerome
Oliff & Berridg,e PLC
Seiko Epson Corporation
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