Method for fabricating a patterned core for a light guide plate

Details Method for fabricating a patterned core for a light guide plate Method for fabricating a patterned core for a light guide plate

2004-06-07

2008-03-11

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C216S024000

Reexamination Certificate

active

07341826

ABSTRACT:
A method for fabricating a patterned core for a light guide plate includes: providing a substrate (500); coating a photo-resist layer (600) on the substrate; exposing the photo-resist layer to light using a photo-mask (700), the photo-mask having patterns, wherein a line-width of each pattern is less than that of a corresponding pattern of the patterned core; developing the photo-resist layer; wet etching the substrate; and removing remaining photo-resist from the substrate. Because of the isotropic directionality of the wet etching, the horizontal component of the etching can appreciably enlarge a horizontal dimension of each etched area, thereby compensating for the difference in size between each pattern of the photo-mask and the corresponding pattern of the finished core. Thus, only one semiconductor process having an exposing, a developing and an etching step is needed to fabricate the core having fine patterns. The method is relatively simple, and reduces operating costs.

REFERENCES:
patent: 6207247 (2001-03-01), Morita
patent: 2001-052519 (2007-02-01), None

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