Method of fabricating a thin film transistor for an array panel

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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C438S151000, C438S157000, C257S250000, C257SE29151

Reexamination Certificate

active

07425473

ABSTRACT:
A method for making a thin film transistor, TFT, (306) on a substrate includes a photolithographic process step of patterning three layers of materials to form a TFT (306) and to form a bridging structure (308) crossing over a TFT gate bus-line conductor (202) at a cross over region; followed by patterning a conductor metal to form a TFT source electrode terminal (404) and a TFT drain electrode terminal (402), and to comprise a continuous data bus-line (206) extending over the bridging structure (308).

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patent: 2005/0136574 (2005-06-01), Shih
patent: 2003-303835 (2003-10-01), None

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