Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-03-11
2008-03-11
Schilling, Richard L. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000, C526S257000, C526S281000, C528S040000, C549S014000, C549S273000, C549S295000, C549S320000, C549S323000
Reexamination Certificate
active
11033010
ABSTRACT:
The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
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Rhodes Larry F.
Seger Lawrence
Wu Xiaoming
Promerus LLC
Renner , Otto, Boisselle & Sklar, LLP
Schilling Richard L.
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