Methods for improving quality of high temperature oxide...

Details Methods for improving quality of high temperature oxide... Methods for improving quality of high temperature oxide...

2008-01-29

2008-01-29

Le, Dung A. (Department: 2818)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257S192000, C257SE21191, C257SE21241, C438S778000

Reexamination Certificate

active

11431087

ABSTRACT:
A method and apparatus are disclosed for reducing the concentration of chlorine and/or other bound contaminants within a semiconductor oxide composition that is formed by chemical vapor deposition (CVD) using a semiconductor-element-providing reactant such as dichlorosilane (DCS) and an oxygen-providing reactant such as N2O. In one embodiment, a DCS-HTO film is annealed by heating N2O gas to a temperature in the range of about 825° C. to about 950° C. so as to trigger exothermic decomposition of the N2O gas and flowing the heated gas across the DCS-HTO film so that disassociated atomic oxygen radicals within the heated N2O gas can transfer disassociating energy to chlorine atoms bound within the DCS-HTO film and so that the atomic oxygen radicals can fill oxygen vacancies within the semiconductor-oxide matrix of DCS-HTO film. An improved ONO structure may be formed with the annealed DCS-HTO film for use in floating gate or other memory applications.

REFERENCES:
patent: 5312783 (1994-05-01), Takasaki et al.
patent: 6218315 (2001-04-01), Ballamine et al.
patent: 6461982 (2002-10-01), DeBoer et al.
patent: 6509283 (2003-01-01), Thomas
patent: 6537461 (2003-03-01), Nakahara et al.
patent: 6930060 (2005-08-01), Chou et al.

Affiliated with

Also associated with

Rating

Methods for improving quality of high temperature oxide... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods for improving quality of high temperature oxide..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for improving quality of high temperature oxide... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3951047