Resist pattern thickening material and process for forming...

Details Resist pattern thickening material and process for forming... Resist pattern thickening material and process for forming...

2008-04-22

2008-04-22

Lee, Sin (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S313000, C430S323000, C430S331000

Reexamination Certificate

active

10975047

ABSTRACT:
The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during patterning. The resist pattern thickening material contains a resin and a polyhydric alcohol. The present invention also provides a process for forming a resist pattern and a process for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.

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