Standard reference for metrology and calibration method of...

Details Standard reference for metrology and calibration method of... Standard reference for metrology and calibration method of...

Filed on

2008-04-15

Date issued

2008-04-15

Examiner

Wells, Nikita (Department: 2881)

Patent Class

Radiant energy

SubClass

Inspection of solids or liquids by charged particles

SubSubClass

Electron probe type

Other Related Categories

C250S491100, C250S492100, C250S492200, C250S311000

Type

Reexamination Certificate

Status

active

Patent number

11481973

Description

ABSTRACT:
An electron-beam metrology system includes a specimen stage to mount a specimen on which a device pattern is formed, electron optics to radiate the device pattern with an electron-beam, a secondary electron detector to detect a secondary electron generated by the radiation of the electron-beam, and an information processing system to analyze a signal obtained from the secondary electron detector. A standard reference for metrology is held on the specimen stage, and the standard reference includes a first grating unit pattern including an array of gratings having pitch sizes which are verified by an optical method, and a second grating unit pattern including an array of gratings having pitch sizes which are smaller than the pitch sizes of the first grating unit pattern.

REFERENCES:
patent: 5422723 (1995-06-01), Paranjpe et al.
patent: 6566654 (2003-05-01), Funatsu et al.
patent: 2004/0263846 (2004-12-01), Kwan
patent: 07-071947 (1995-03-01), None
patent: P2000-232138 (2000-08-01), None
patent: P2001-127125 (2001-05-01), None
patent: 2004-251682 (2004-09-01), None

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