Semiconductor device with scattering bars adjacent...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S774000, C257SE23145

Reexamination Certificate

active

10867076

ABSTRACT:
A semiconductor device and method of manufacture thereof wherein scattering bars are disposed on both sides of an isolated conductive line of a semiconductor device to improve the lithography results. The scattering bars have a sufficient width and are spaced a sufficient distance from the isolated conductive line so as to increase the depth of focus of the isolated conductive line during the patterning of the semiconductor device. The scattering bars are left remaining in the finished semiconductor device after the manufacturing process is completed.

REFERENCES:
patent: 5476817 (1995-12-01), Numata
patent: 5751056 (1998-05-01), Numata
patent: 5798298 (1998-08-01), Yang et al.
patent: 5811352 (1998-09-01), Numata et al.
patent: 6258715 (2001-07-01), Yu et al.
patent: 6259115 (2001-07-01), You et al.
patent: 6307265 (2001-10-01), Anand et al.
patent: 6492097 (2002-12-01), Chen et al.
patent: 6492259 (2002-12-01), Dirahoui et al.
patent: 6610592 (2003-08-01), Shue et al.
patent: 6664642 (2003-12-01), Koubuchi et al.
patent: 6833622 (2004-12-01), Zagrebelny et al.
patent: 2001/0022399 (2001-09-01), Koubuchi et al.
patent: 2002/0003305 (2002-01-01), Umakoshi et al.
patent: 2002/0048929 (2002-04-01), Nalk et al.
patent: 2002/0175419 (2002-11-01), Wang et al.
patent: 2003/0042611 (2003-03-01), Mori
patent: 2003/0092260 (2003-05-01), Lui et al.
patent: 2003/0205817 (2003-11-01), Romankiw
patent: 2003/0237064 (2003-12-01), White et al.
patent: 2004/0113238 (2004-06-01), Hasunuma et al.
patent: 2004/0119164 (2004-06-01), Kurashima et al.
patent: 2005/0110151 (2005-05-01), Tamura et al.
patent: 2005/0121790 (2005-06-01), Cleeves et al.
patent: 2005/0253268 (2005-11-01), Hsu et al.
patent: 2006/0118960 (2006-06-01), Landis
Wolf, S., et al., “Silicon Processing for the VLSI Era: vol. 1—Process Technology,” 2nd Ed., pp. 628-630, Laltice Press, Sunset Beach, CA, 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device with scattering bars adjacent... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device with scattering bars adjacent..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device with scattering bars adjacent... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3920804

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.