Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2008-05-13
2008-05-13
Mathews, Alan (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000, C355S071000, C355S077000, C359S292000
Reexamination Certificate
active
11012003
ABSTRACT:
The present invention provides methods and apparatus for accomplishing a phase shift lithography process using a off axis light to reduce the effect of zero order light to improve the process window for maskless phase shift lithography systems and methodologies. A lithography system is provided. The lithography system provided uses off axis light beams projected onto a mirror array configured to generate a phase shift optical image pattern. This pattern is projected onto a photoimageable layer formed on the target substrate to facilitate pattern transfer.
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Yashesh Shroff et al., “Optical Analysis of Mirror Based Pattern Generation”, Proceedings of SPIE, vol. 5037 (2003), pp. 550-559.
U.S. Appl. No. 10/825,342, entitled: “Optimized Mirror Design for Optical Direct Write”, by inventors Nicholas Eib et al., filed April 14, 2004.
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Callan Neal P.
Croffie Ebo H.
Eib Nicholas K.
Beyer & Weaver, LLP
LSI Corporation
Mathews Alan
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