Photoresist composition and method pattern forming using the...

Details Photoresist composition and method pattern forming using the... Photoresist composition and method pattern forming using the...

2008-03-04

2008-03-04

Chu, John S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S287100, C430S288100

Reexamination Certificate

active

10720966

ABSTRACT:
This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.

REFERENCES:
patent: 6140025 (2000-10-01), Imai et al.
patent: 6306555 (2001-10-01), Schulz et al.
patent: 6399277 (2002-06-01), Nojima et al.
patent: 6602651 (2003-08-01), Yoshitake et al.
patent: 6660457 (2003-12-01), Imai et al.
patent: 2002/0177073 (2002-11-01), Melisaris et al.
patent: 2003/0009053 (2003-01-01), Nishikubo et al.

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