Plasma processing method and apparatus

Details Plasma processing method and apparatus Plasma processing method and apparatus

Filed on

2007-10-09

Date issued

2007-10-09

Examiner

Dinh, Trinh (Department: 2821)

Patent Class

Electric lamp and discharge devices: systems

SubClass

Discharge device load with fluent material supply to the...

SubSubClass

Plasma generating

Other Related Categories

C315S111310

Type

Reexamination Certificate

Status

active

Patent number

11080550

Description

ABSTRACT:
A method and apparatus for processing a target substance by using atmospheric-pressure plasma produced by a composite waveform generated by superimposing a high-frequency sine wave and a high-frequency square wave at the same or substantially the same frequency and at the same or substantially the same phase are provided.

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