Solid-state image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

Other Related Categories

C257S291000, C257SE27133

Type

Reexamination Certificate

Status

active

Patent number

11096925

Description

ABSTRACT:
A solid-state image sensor in which a plurality of unit pixel portions, each including a light receiving area which generates electric charges by light irradiation and a transistor which outputs an electric signal in accordance with the light receiving area, are arranged in a two-dimensional array, in which: each of the unit pixel portions includes a first conductive type well region provided on a second conductive type semiconductor layer in a first conductive type substrate, a part of the first conductive type well region and a second conductive type semiconductor layer region laminated on a part of the first conductive type well region form the light receiving area; electric charge storage area for storing electric charges generated in the light receiving area is provided in the first conductive type well region to read out an electric signal in accordance with an amount of electric charges stored in the electric charge storage area from the transistor; and the second conductive type semiconductor layer region has a maximum impurity concentration portion in the depth direction of the first conductive type substrate is at a surface of the first conductive type substrate.

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