Boots – shoes – and leggings
Patent
1992-03-19
1996-06-04
Zanelli, Michael
Boots, shoes, and leggings
31511131, H05H 100
Patent
active
055239552
ABSTRACT:
A probe to be inserted in-line in an AC plasma processing system allows accurate, real time determination of plasma parameters such as power and complex impedance over a broad dynamic range. Any need to know power output from a source is avoided and signals are selected to optimize accuracy such that only two alternating signals need be sensed for many applications. Signals are selected such that magnitudes of simple alternating signals can be easily measured as scalar values in a fashion that affords the use of these values to completely characterize the power actually delivered to the processing plasma and its complex impedance in real time. Plasma characterization can be limited to only specific frequencies for more accurate determination. Microstrip directional couplers are used to sense signals from the power transmission. These signals are then utilized to derive simple alternating signals representative of power or voltage. Three or more scalar values representative of the magnitude of the alternating signals and their combination serve as the variable inputs to determine complex reflection coefficient or impedance using known formulas. Use of a sign bit detector or assumptions with respect to the processing plasma is disclosed for complete characterization of the plasma in an efficient manner.
REFERENCES:
patent: 3614606 (1971-10-01), Schmidt et al.
patent: 4104583 (1978-07-01), Engen
patent: 4207137 (1980-06-01), Tretola
patent: 4427936 (1984-01-01), Riblet et al.
patent: 4489271 (1984-12-01), Riblet
patent: 4521728 (1985-06-01), Li
patent: 4571545 (1986-02-01), Griffin et al.
patent: 4579618 (1986-04-01), Celestino et al.
patent: 4622094 (1986-11-01), Otsubo
patent: 4629940 (1986-12-01), Gagne et al.
patent: 4641082 (1987-02-01), Griffin et al.
patent: 4847792 (1989-07-01), Barna et al.
patent: 4935661 (1990-06-01), Heinecke et al.
patent: 4954212 (1990-09-01), Gabriel et al.
patent: 4956582 (1990-09-01), Bourassa
patent: 4990859 (1991-02-01), Bouyer et al.
patent: 5014217 (1991-05-01), Savage
patent: 5053725 (1991-10-01), Gesche et al.
patent: 5175472 (1992-12-01), Johnson, Jr. et al.
Paul Rummell; Monitoring & Control of RF Electrical Parameters.
Near Plasma Loads; pp. 20-23, May, 1991.
Elizabeth Pennisi; Pass the Plasma, . . . Please;. 312-314; May 1991.
Glenn Engen; Calibration of an Arbitrary Six-Port Junction for Measurement of Active & Passive Circuit Parameters; pp. 295-299; Dec. 1973.
Glenn Engen; An Improved Circuit for Implementing the Six-Port Technique of Microwave Measurements; pp. 1080-1083; Dec. 1977.
Glenn Engen; Determination of Microwave Phase & Amplitude from Power Measurements; pp. 414-418; Dec. 1976.
Glenn Engen; Application of an Arbitrary 6-Port Junction to Power-Measurement Problems; pp. 470-474; Nov. 1972.
H. R. Koenig. L. I. Maissel; Application of RF Discharges to Sputtering; pp. 168-171; Mar. 1970.
"External Measurement on a Plasma Etch Chamber and Their Interpretation Regarding Plasma Properties and Etch Conditions," IEEE International Conference on Plasma Science; Canada; Carlile et al; p. 17.
"A Broadband Short-pulse Plasma Diagnostic Technique for Measuring Electroacoustic Resonances," Jun. 1972 Proceedings of IEEE, vol. 60; Baird; pp. 754-755.
"High Impedence Capacity Divider Probe for Potential Measurements in Plasmas;" Review of Scientific Instruments; vol. 53 No. 10; Oct. 1982; United States; Benjamin; pp. 1541-1543.
Advanced Energy Industries Inc.
Santangel Luke
Zanelli Michael
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