Plasma treatment apparatus and plasma generation method

Details Plasma treatment apparatus and plasma generation method Plasma treatment apparatus and plasma generation method

2007-12-11

2007-12-11

Hasanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345410, C156S345360

Reexamination Certificate

active

10498056

ABSTRACT:
A plasma processing apparatus includes a table (22) on which a processing target (W) is to be placed, a processing vessel (11) where the table is to be accommodated, and a power feed unit (40) for supplying a high-frequency electromagnetic field (F) into the processing vessel. The power supply unit includes at least a cylindrical waveguide (41) for introducing the high-frequency electromagnetic field, and a circular polarization antenna (51) arranged at one end of the cylindrical waveguide to supply the high-frequency electromagnetic field as a rotating electromagnetic field rotating in a plane perpendicular to its traveling direction. Accordingly, there is no need of providing a circular polarization converter for converting the high-frequency electromagnetic field in the cylindrical waveguide into the rotating electromagnetic field. Consequently, it is possible to solve problems caused by the circular polarization converter, stabilize the operation of plasma generation by performing circular polarization feeding, and perform a continuous operation for a long period of time.

REFERENCES:
patent: 3715688 (1973-02-01), Woodward
patent: 6016766 (2000-01-01), Pirkle et al.
patent: 6325018 (2001-12-01), Hongoh
patent: 6476557 (2002-11-01), Leng et al.
patent: 2002/0129904 (2002-09-01), Itabashi et al.
patent: 2002/0148564 (2002-10-01), Ishii et al.
patent: 0779644 (1996-12-01), None
patent: 04207703 (1992-07-01), None
patent: 11-040394 (1999-02-01), None
patent: 11-111494 (1999-04-01), None
patent: 2000268996 (2000-09-01), None

Affiliated with

Also associated with

Rating

Plasma treatment apparatus and plasma generation method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma treatment apparatus and plasma generation method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma treatment apparatus and plasma generation method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3889214