Chemical amplification type positive resist composition

Details Chemical amplification type positive resist composition Chemical amplification type positive resist composition

2007-02-06

2007-02-06

Visconti, Geraldina (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S913000, C430S914000

Reexamination Certificate

active

10548843

ABSTRACT:
There is provided a positive resist composition which enables the formation of a fine resist pattern, enables the angle of the taper shape within that resist pattern to be controlled to a suitable angle, and enables the formation of a resist pattern with an excellent depth width of focus. This positive resist composition is formed from a chemically amplified positive resist composition in which the light transmittance of a resist film of thickness 0.3 μm, relative to light of wavelength 248 nm, is within a range from 20 to 75%.

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