Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-02-13
2007-02-13
Smoot, Stephen W. (Department: 2813)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S615000, C438S617000
Reexamination Certificate
active
10944816
ABSTRACT:
A method for mounting a passive component on a wafer. A passivation layer is disposed on a wafer having at least one first metal pad and at least one second metal pad thereon, which substantially exposes the first and second metal pads. A capping layer is formed on the exposed first metal pad, and an under ball metallurgy (UBM) layer is formed on the exposed second metal pad. A photoresist pattern layer is formed overlying the wafer to cover the capping layer and the passivation layer and expose the UBM layer. A solder bump is formed on the exposed UBM layer. After the photoresist pattern layer and the capping layer are successively removed, a passive component is mounted on the wafer through the solder bump.
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Advanced Semiconductor Engineering Inc.
Birch, Stewart, Kolasch and Birch LLP
Smoot Stephen W.
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