Reliable high-voltage junction field effect transistor and...

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

Reexamination Certificate

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Details

C257S256000, C257S272000, C257S274000, C257S409000, C257SE29314

Reexamination Certificate

active

10956863

ABSTRACT:
The present invention provides a high-voltage junction field effect transistor (JFET), a method of manufacture and an integrated circuit including the same. One embodiment of the high-voltage junction field effect transistor (JFET) (300) includes a well region (320) of a first conductive type located within a substrate (318) and a gate region (410) of a second conductive type located within the well region (320), the gate region (410) having a length and a width. This embodiment further includes a source region (710) and a drain region (715) of the first conductive type located within the substrate (318) in a spaced apart relation to the gate region (410) and a doped region (810) of the second conductive type located in the gate region (410) and extending along the width of the gate region (410). In place of or addition to the doped region (810), the high-voltage junction field effect transistor (JFET) (300) may includes a conductive field plate (920) located over and extending along the width of the gate region (410).

REFERENCES:
patent: 4322738 (1982-03-01), Bell et al.
patent: 4407005 (1983-09-01), Bell et al.
patent: 4914491 (1990-04-01), Vu
patent: 5068705 (1991-11-01), Tran
patent: 5118632 (1992-06-01), Schrantz
patent: 5382535 (1995-01-01), Malhi et al.
patent: 5973341 (1999-10-01), Letavic et al.
patent: 2004/0036115 (2004-02-01), Disney

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