Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-12-18
2007-12-18
Lin, Sun James (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
11405029
ABSTRACT:
System and method is disclosed for breaking an integrated circuit design to be printed into two or more exposures by lithographic equipment, each of the two or more exposures has at least the minimum pitch. Together, these multiple exposures print an integrated circuit design that could not be printed in one exposure alone.
REFERENCES:
patent: 4855793 (1989-08-01), Carlson
patent: 5652084 (1997-07-01), Cleeves
patent: 6383697 (2002-05-01), Vladimirsky et al.
patent: 6553562 (2003-04-01), Capodieci et al.
patent: 6839126 (2005-01-01), Yen et al.
patent: 2005/0162627 (2005-07-01), Finders et al.
patent: 2006/0216649 (2006-09-01), Paxton et al.
patent: 2007/0003878 (2007-01-01), Paxton et al.
patent: 2007/0031740 (2007-02-01), Chen et al.
Huckabay, J. et al. “Automatic Pitch Decomposition for Improved Process Window When Printing Dense Features at k1eff<0.20” Proceedings of SPIE, May 20, 2006, vol. 6283, 9 pgs.
Huckabay, J. et al. “Process Results Using Automatic Pitch Decomposition and Double Patterning Technology (DPT) at k1eff<0.20” Proceedings of SPIE, Oct. 20, 2006, vol. 6349, 11 pgs.
International Search Report and Written Opinion dated Mar. 1, 2007 for PCT/US2006/018892.
Dusa, M. et al. “An Integrated Lithography Concept with Application on 45nm 1/2 pitch flash memory devices” Optical Microlithography XIX, Proceedings of SPIE, 2006, vol. 6154, 12 pgs.
Hsu, S. et al. “Double Exposure Technique for 45nm node and Beyond” 25th Annual BACUS Symposium on Photomask Technology, Proceeding of SPIE, 2005, vol. 5992, 16 pgs.
Maenhoudt, M. et al. “Double Patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ=193nm” Optical Microlithography XVIII, Proceedings of SPIE, 2005, vol. 5754, pp. 1508-1518.
Park, J. et al. “Application Challenges with Double Patterning Technology (DPT) beyond 45nm” Photomask Technology 2006, Proceeding of SPIE, 2006, 12 pgs.
Bingham & McCutchen LLP
Cadence Design Systems Inc.
Lin Sun James
LandOfFree
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