Optical system for ultraviolet light

Optical: systems and elements – Having significant infrared or ultraviolet property

Reexamination Certificate

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C359S351000, C359S355000, C359S358000, C359S665000

Reexamination Certificate

active

11252598

ABSTRACT:
An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

REFERENCES:
patent: 5353156 (1994-10-01), Chung
patent: 5446591 (1995-08-01), Medlock
patent: 5532880 (1996-07-01), Robb
patent: 5627674 (1997-05-01), Robb
patent: 6600608 (2003-07-01), Shafer et al.
patent: 2005/0179877 (2005-08-01), Mulkens et al.
patent: 2005/0190435 (2005-09-01), Shafer et al.
patent: 2005/0219707 (2005-10-01), Schuster et al.
patent: 2005/0248856 (2005-11-01), Omura et al.
patent: 1 524 558 (2005-04-01), None
patent: WO 03/075049 (2003-09-01), None
patent: WO 2005/050324 (2005-06-01), None
U.S. Appl. No. 60/536,248, Shafer et al.
U.S. Appl. No. 60/632,550, filed Dec. 1, 2004, Weippert et al.

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