Method and apparatus for the compensation of edge ring wear...

Details Method and apparatus for the compensation of edge ring wear... Method and apparatus for the compensation of edge ring wear...

2007-02-13

2007-02-13

Paschall, Mark (Department: 3742)

Electric heating

Metal heating

By arc

C219S121410, C219S121540, C156S345230

Reexamination Certificate

active

10971971

ABSTRACT:
A method for processing a plurality of substrates in a plasma processing chamber of a plasma processing system, each of the substrate being disposed on a chuck and surrounded by an edge ring during the processing. The method includes processing a first substrate of the plurality of substrates in accordance to a given process recipe in the plasma processing chamber. The method further includes adjusting, thereafter, a capacitance value of a capacitance along a capacitive path between a plasma sheath in the plasma processing chamber and the chuck through the edge ring by a given value. The method additionally includes processing a second substrate of the plurality of substrates in accordance to the given process recipe in the plasma processing chamber after the adjusting, wherein the adjusting is performed without requiring a change in the edge ring.

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PCT International Search Report Mailed May 11, 2004, PCT/US03/29309.
IPOS(Intellectual Property Office of Singapore) Written Opinion for Singapore Patent Application No. 200501631-6 dated Jan. 23, 2006.

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