Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Reexamination Certificate
2007-02-20
2007-02-20
Zervigon, Rudy (Department: 1763)
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
C118S663000, C118S669000, C118S688000, C156S345240, C414S222010, C414S222020, C414S935000, C414S936000
Reexamination Certificate
active
10484709
ABSTRACT:
A semiconductor process system (10) includes a measuring section (40), an information processing section (51), and a control section (52). The measuring section (40) measures a characteristic of a test target film formed on a target substrate (W) by a semiconductor process. The information processing section (51) calculates a positional correction amount of the target substrate (W) necessary for improving planar uniformity of the characteristic, based on values of the characteristic measured by the measuring section (40) at a plurality of positions on the test target film. The control section (52) controls a drive section (30A,32A) of a transfer device (30), based on the positional correction amount, when the transfer device (30) transfers a next target substrate (W) to the support member (17) to perform the semiconductor process.
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Machine Translation for JP 07056611 A.
Fujita Takehiko
Sakamoto Koichi
Tonegawa Yamato
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
Zervigon Rudy
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