Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-06-26
2007-06-26
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S907000, C430S910000
Reexamination Certificate
active
10388408
ABSTRACT:
A positive resist composition comprising: (A) a compound capable of generating an acid on exposure to active light rays or a radiation; (B) a resin which is insoluble or sparingly soluble in an alkali and becomes alkali-soluble by an action of an acid; and (D) an acyclic compound having at least three groups selected from a hydroxyl group and a substituted hydroxyl group.
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High Performance Acrylic Polymers for Chemically Amplified Photoresist Applications—Robert D. Allen, Gregory M. Wallraff and William D. Hinsberg—J. Vac. Sci. Technol. B 9 (6). Nov. Dec. 1991 pp. 3357-3361.
Fujifilm Corporation
Lee Sin
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