Positive resist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S326000, C430S907000, C430S910000

Reexamination Certificate

active

10388408

ABSTRACT:
A positive resist composition comprising: (A) a compound capable of generating an acid on exposure to active light rays or a radiation; (B) a resin which is insoluble or sparingly soluble in an alkali and becomes alkali-soluble by an action of an acid; and (D) an acyclic compound having at least three groups selected from a hydroxyl group and a substituted hydroxyl group.

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European Search Report dated Jun. 11, 2003.
High Performance Acrylic Polymers for Chemically Amplified Photoresist Applications—Robert D. Allen, Gregory M. Wallraff and William D. Hinsberg—J. Vac. Sci. Technol. B 9 (6). Nov. Dec. 1991 pp. 3357-3361.

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