Positive-working resist composition

Details Positive-working resist composition Positive-working resist composition

2007-07-10

2007-07-10

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C568S341000

Reexamination Certificate

active

10863347

ABSTRACT:
A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35° C. or more or a boiling point of 100° C./10 mmHg or more:and (D) a solvent.

REFERENCES:
patent: 3932510 (1976-01-01), Muller
patent: 4632899 (1986-12-01), Takeda
patent: 5352551 (1994-10-01), Mizuguchi et al.
patent: 1260864 (2002-11-01), None
patent: 6-130665 (1994-05-01), None
patent: 2002-148784 (2002-05-01), None

Affiliated with

Also associated with

Rating

Positive-working resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive-working resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3810595