Photoresist composition for LCD light diffuse reflecting film

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S284100, C430S281100

Reexamination Certificate

active

11091580

ABSTRACT:
A photoresist composition for LCD light diffuse reflecting film is disclosed, which comprises (a) 8 to 90% by weight of base-soluble resin; (b) 1 to 30% by weight of polyfunctional unit; (c) 0.1 to 20% by weight of photopolymerization initiator; (d) 0.1 to 20% by weight of thermosetting cross-linking reagent; (e) 0.01 to 10% by weight of ultraviolet absorber; and (f) 8 to 90% by weight of solvent.

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RN 1328-53-6 , Registry ACS on STN, C.I. Pigment Green 7, entered STN: Nov. 16, 1984, 2 pages.
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RN 3846-71-7, Caplus, REgistry ACS on STN, Phenol, 2-(2H-benzotriazol-2-yl)-4,6-bis(1,1-dimethylethyl)- (9CI) (CA □□Index Name), entered STN: Nov. 16, 1984.

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