Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-09-18
2007-09-18
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S284100, C430S281100
Reexamination Certificate
active
11091580
ABSTRACT:
A photoresist composition for LCD light diffuse reflecting film is disclosed, which comprises (a) 8 to 90% by weight of base-soluble resin; (b) 1 to 30% by weight of polyfunctional unit; (c) 0.1 to 20% by weight of photopolymerization initiator; (d) 0.1 to 20% by weight of thermosetting cross-linking reagent; (e) 0.01 to 10% by weight of ultraviolet absorber; and (f) 8 to 90% by weight of solvent.
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Juan Chun-Wei
Liu Shao-Yun
Bacon & Thomas PLLC
Everlight USA, Inc.
Hamilton Cynthia
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