Positive resist composition

Details Positive resist composition Positive resist composition

Filed on

2007-05-15

Date issued

2007-05-15

Examiner

Schilling, Richard L. (Department: 1752)

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Imaging affecting physical property of radiation sensitive...

SubSubClass

Radiation sensitive composition or product or process of making

Other Related Categories

C430S905000, C430S914000

Type

Reexamination Certificate

Status

active

Patent number

10840624

Description

ABSTRACT:
A positive resist composition comprising (A) polysiloxane or polysilsesquioxane that has a property of increasing solubility in an alkali developing solution by the action of an acid and contains a group capable of being decomposed with an acid, (B) a compound that generates a sulfonic acid upon irradiation of an actinic ray or radiation and (C) an organic basic compound, wherein an amount of the compound that generates a sulfonic acid upon irradiation of an actinic ray or radiation is from 6 to 20% by weight based on the total solid content of the positive resist composition.

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Keiji Watanabe et al., “Study of Bi-level Resist System with Conductive Bottom Layer for EB lithography”, Journal of Photopolymer Science and Technology, vol. 19, No. 4 (1996), pp. 697-706.

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