Electric heating – Heating devices – With power supply and voltage or current regulation or...
Reexamination Certificate
2007-01-09
2007-01-09
Paschall, Mark (Department: 3742)
Electric heating
Heating devices
With power supply and voltage or current regulation or...
C219S486000, C118S725000, C361S234000
Reexamination Certificate
active
11245764
ABSTRACT:
An electrostatic chuck (“chuck”) is provided for controlling a radial temperature profile across a substrate when exposed to a plasma. The chuck includes a number of independently controllable gas volumes that are each defined in a radial configuration relative to a top surface of the chuck upon which the substrate is to be supported. The chuck includes a support member and a base plate. The base plate positioned beneath and in a spaced apart relationship from the support member. The gas volumes are defined between the base plate and the support member, with separation provided by annularly-shaped thermally insulating dividers. Each gas volume can include a heat generation source. A gas pressure and heat generation within each gas volume can be controlled to influence thermal conduction through the chuck such that a prescribed radial temperature profile is achieved across the substrate.
REFERENCES:
patent: 5294778 (1994-03-01), Carman et al.
patent: 6080970 (2000-06-01), Yoshida et al.
patent: 6508884 (2003-01-01), Kuibira et al.
patent: 6730175 (2004-05-01), Yudovsky et al.
Lam Research Corporation
Martine & Penilla & Gencarella LLP
Paschall Mark
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