Method of determining alignment of a template and a...

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

Reexamination Certificate

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C430S030000, C430S322000

Reexamination Certificate

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10805916

ABSTRACT:
The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks and the template having template alignment marks, the method including, reducing a distance between the substrate and the template to cause a spreading of the activating light curable liquid; and varying an overlay placement of the template with respect to the substrate such that the template alignment marks are substantially aligned with the substrate alignment marks before the spreading causes the activating light curable liquid to cover an area between the substrate alignment marks and the template alignment marks.

REFERENCES:
patent: 3783520 (1974-01-01), King
patent: 4512848 (1985-04-01), Deckman et al.
patent: 4600309 (1986-07-01), Fay
patent: 4731155 (1988-03-01), Napoli et al.
patent: 4848911 (1989-07-01), Uchida et al.
patent: 5028366 (1991-07-01), Harakal et al.
patent: 5074667 (1991-12-01), Miyatake
patent: 5148036 (1992-09-01), Matsugu et al.
patent: 5148037 (1992-09-01), Suda et al.
patent: 5414514 (1995-05-01), Smith et al.
patent: 5425848 (1995-06-01), Haisma et al.
patent: 5601641 (1997-02-01), Stephens
patent: 5669303 (1997-09-01), Maracas et al.
patent: 5737064 (1998-04-01), Inoue et al.
patent: 5772905 (1998-06-01), Chou
patent: 5808742 (1998-09-01), Everett et al.
patent: 5849209 (1998-12-01), Kindt-Larsen et al.
patent: 5849222 (1998-12-01), Jen et al.
patent: 5999245 (1999-12-01), Suzuki
patent: 6049373 (2000-04-01), Miyatake
patent: 6088103 (2000-07-01), Everett et al.
patent: 6150231 (2000-11-01), Muller et al.
patent: 6285439 (2001-09-01), Miyatake
patent: 6295120 (2001-09-01), Miyatake
patent: 6309580 (2001-10-01), Chou
patent: 6334960 (2002-01-01), Willson et al.
patent: 6383888 (2002-05-01), Stirton
patent: 6388755 (2002-05-01), Zhao
patent: 6391217 (2002-05-01), Schaffer et al.
patent: 6482742 (2002-11-01), Chou
patent: 6489068 (2002-12-01), Kye
patent: 6517995 (2003-02-01), Jacobenson et al.
patent: 6518189 (2003-02-01), Chou
patent: 6522411 (2003-02-01), Moon et al.
patent: 6580172 (2003-06-01), Mancini et al.
patent: 6630410 (2003-10-01), Trapp et al.
patent: 6636311 (2003-10-01), Ina et al.
patent: 6646662 (2003-11-01), Nebashi et al.
patent: 6665119 (2003-12-01), Kurtz et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6713238 (2004-03-01), Chou et al.
patent: 6719915 (2004-04-01), Willson et al.
patent: 6776094 (2004-08-01), Whitesides et al.
patent: 6791669 (2004-09-01), Poon
patent: 6809356 (2004-10-01), Chou
patent: 6828244 (2004-12-01), Chou
patent: 6842229 (2005-01-01), Sreenivasan et al.
patent: 6900881 (2005-05-01), Sreenivasan et al.
patent: 6902853 (2005-06-01), Sreenivasan et al.
patent: 6908861 (2005-06-01), Sreenivasan et al.
patent: 6916584 (2005-07-01), Sreenivasan et al.
patent: 6916585 (2005-07-01), Sreenivasan et al.
patent: 6919152 (2005-07-01), Sreenivasan et al.
patent: 6921615 (2005-07-01), Sreenivasan et al.
patent: 2002/0042027 (2002-04-01), Chou et al.
patent: 2002/0098426 (2002-07-01), Sreenivasan et al.
patent: 2002/0132482 (2002-09-01), Chou
patent: 2002/0167117 (2002-11-01), Chou
patent: 2002/0177319 (2002-11-01), Chou
patent: 2003/0034329 (2003-02-01), Chou
patent: 2003/0080471 (2003-05-01), Chou
patent: 2003/0080472 (2003-05-01), Chou
patent: 2003/0215577 (2003-11-01), Willson et al.
patent: 2004/0007799 (2004-01-01), Choi et al.
patent: 2004/0008334 (2004-01-01), Sreenivasan et al.
patent: 2004/0009673 (2004-01-01), Sreenivasan et al.
patent: 2004/0021254 (2004-02-01), Sreenivasan et al.
patent: 2004/0021866 (2004-02-01), Watts et al.
patent: 2004/0022888 (2004-02-01), Sreenivasan et al.
patent: 2004/0033515 (2004-02-01), Cao et al.
patent: 2004/0036201 (2004-02-01), Chou et al.
patent: 2004/0046288 (2004-03-01), Chou
patent: 2004/0053146 (2004-03-01), Sreenivasan et al.
patent: 2004/0086793 (2004-05-01), Sreenivasan et al.
patent: 2004/0104641 (2004-06-01), Choi et al.
patent: 2004/0110856 (2004-06-01), Young et al.
patent: 2004/0118809 (2004-06-01), Chou et al.
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2004/0131718 (2004-07-01), Chou et al.
patent: 2004/0137734 (2004-07-01), Chou et al.
patent: 2004/0141163 (2004-07-01), Bailey et al.
patent: 2004/0149687 (2004-08-01), Choi et al.
patent: 2004/0156108 (2004-08-01), Chou et al.
patent: 2004/0163563 (2004-08-01), Bailey et al.
patent: 2004/0168586 (2004-09-01), Bailey et al.
patent: 2004/0168588 (2004-09-01), Choi et al.
patent: 2004/0169441 (2004-09-01), Choi et al.
patent: 2004/0170771 (2004-09-01), Bailey et al.
patent: 2004/0189996 (2004-09-01), Sreenivasan et al.
patent: 2004/0192041 (2004-09-01), Jeong et al.
patent: 2004/0197843 (2004-10-01), Chou et al.
patent: 2004/0200411 (2004-10-01), Willson et al.
patent: 2004/0209177 (2004-10-01), Sreenivasan et al.
patent: 2004/0250945 (2004-12-01), Zheng et al.
patent: 2004/0251775 (2004-12-01), Choi et al.
patent: 2005/0037143 (2005-02-01), Chou et al.
patent: 02-24848 (1990-01-01), None
patent: 02-92603 (1990-04-01), None
patent: WO 99/05724 (1999-02-01), None
patent: WO 00/21689 (2000-04-01), None
patent: WO 01/47003 (2001-06-01), None
patent: WO 02/07199 (2002-01-01), None
patent: WO 03/010289 (2003-02-01), None
patent: WO 03/079416 (2003-09-01), None
patent: WO 03/099536 (2003-12-01), None
patent: WO 2004/114016 (2004-12-01), None
U.S. Appl. No. 10/614,716, filed Jul. 7, 2003, entitled: Conforming Template for Patterning Liquids Disposed on Substrates, naming inventors Sreenivasan et al.
U.S. Appl. No. 10/785,248, filed Feb. 24, 2004, entitled: Method to Control the Relative Position Between a Body and a Substrate, naming inventors Sreenivasan et al.
U.S. Appl. No. 10/864,214, filed Jun. 9, 2004, entitled: Imprint Lithography System to Produce a Light to Impinge upon and Polymerize a Liquid in Superimposition with Template Overlay Marks, naming inventors Sreenivasan et al.
U.S. Appl. No. 10/923,629, filed Aug. 20, 2004, entitled: Apparatus for Imprint Lithography Using an Electric Field, naming inventors Sreenivasan et al.
U.S. Appl. No. 10/978,285, filed Oct. 29, 2004, entitled: Step and Flash Imprint Lithography, naming inventors Willson et al.
U.S. Appl. No. 10/895,214, filed Jul. 20, 2004, Voison.
U.S. Appl. No. 10/923,629, filed Aug. 20, 2004, Sreenivasan et al.
U.S. Appl. No. 10/978,285, filed Oct, 29, 2004, Willson et al.
U.S. Appl. No. 11/000,321, filed Nov. 30, 2004, Nimmakayala et al.
Chou, Nanoimprint Lithography and Lithographically Induced Self-Assembly, MRS Bulletin, pp. 512-517, Jul. 1, 2001.
Choi et al., Design of Orientation Stages for Step and Flash Imprint Lithography, Precision Engineering, pp. 192-199, Jan. 1, 2001.
Colburn et al., Step and Flash Imprint Lithography for sub-100 nm Patterning, Proceedings of SPIE vol. 3997, pp. 453-457, Jan. 1, 2000.
Chou et al., Imprint Lithography with 25-Nanometer Resolution, Science vol. 272, pp. 85-87, Apr. 5, 1996.
Chou et al., Imprint Lithography with Sub-10 nm Feature Size and High Throughput, Microelectronic Engineering 35, pp. 237-240, Jan. 1, 1997.
Haisma et al., Mold-assisted Nanolithography: A Process for Reliable Pattern Replication, J. Vac. Sci. Technol. B, pp. 4124-4128, Nov. 1, 1996.
Chou et al., Imprint of Sub-25 nm Vias and Trenches in Polymers, Appl. Phys. Lett. 67 (21), Nov. 20, 1995.
Johnson et al., Advances in Step and Flash Imprint Lithography, SPIE Microlithography Conference, Feb. 23, 2003.
Chou et al., Lithographically Induced Self-assembly of Periodic Polymer Micropillar Arrays, J. Vac. Sci. Technol. B 17 (6), pp. 3197-3202, Nov. 1, 1999.
Colburn et al., Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning, Proc. Of SPIE, vol. 3676, Mar. 1, 1999.
Heidari, Nanoimprint Lithography at the 6 in. Wafer Scale, J. Vac. Sci. Technol. B 18(6), pp. 3557-3560, Nov. 1, 2000.
Translation of Japanese Patent 02-92603.
Translation of Japanese Patent 02-24848.
Chou et al., Ultrafast and Direct Imprint of Nanostructures in Silicon, Nature, col. 417, (Jun. 2002), pp. 835-83

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