Solid-state image sensor for improving sensing quality and...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

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Reexamination Certificate

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10711666

ABSTRACT:
A method of forming a solid-state image sensor is provided. The method includes the steps of forming a plurality of photosensor elements on a substrate; forming a plurality of color filters on the plurality of photosensors; forming a light blocking member between adjacent color filters; and forming a plurality of microlenses on the plurality of color filters. Each photosensor with each corresponding color filter and microlens is used for receiving an incident light of specific spectrum.

REFERENCES:
patent: 6246081 (2001-06-01), Abe
patent: 6255640 (2001-07-01), Endo et al.
patent: 6312969 (2001-11-01), Abe
patent: 6642963 (2003-11-01), Assadi

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