Method of controlling dry etching by applying an AC voltage to t

Details Method of controlling dry etching by applying an AC voltage to t Method of controlling dry etching by applying an AC voltage to t

1984-12-12

1986-11-11

Massie, Jerome

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156345, 20419232, H01L 21306

Patent

active

046220941

ABSTRACT:
Dry etching is carried out in such a manner that a periodical potential is applied to an electrode having a workpiece thereon, the above potential changes substantially linearly at a first part of each period and has a reverse polarity at a second part of each period, the linear change of potential at the first part compensates for a change in surface potential of the workpiece to keep constant an ion accelerating voltage between a plasma and the surface of the workpiece, and the potential of the reverse polarity at the second part allows charged particle of the reverse polarity to impinge on the workpiece, thereby neutralizing the electric charge on the surface of the workpiece. Accordingly, the energy of ion incident on the workpiece is distributed in a narrow range around a desired value, and thus an etching rate and a selection ratio can be improved.

REFERENCES:
patent: 4222838 (1980-09-01), Bhagat et al.
patent: 4298419 (1981-11-01), Suzuki et al.
patent: 4316791 (1982-02-01), Taillet
patent: 4333816 (1982-06-01), Kuyel
patent: 4352725 (1982-10-01), Tsukuda
patent: 4464223 (1984-08-01), Gorin
patent: 4496448 (1985-01-01), Tai et al.
patent: 4585516 (1986-04-01), Corn et al.

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