Polymer, positive resist composition, and patterning process...

Details Polymer, positive resist composition, and patterning process... Polymer, positive resist composition, and patterning process...

2007-03-13

2007-03-13

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S910000, C430S326000, C526S282000, C526S268000, C526S256000, C526S266000, C526S270000

Reexamination Certificate

active

10945397

ABSTRACT:
There is disclosed a polymer which at least has the repeating unit represented by the following general formula (1a), and the repeating unit represented by the following general formula (1b) and/or the repeating unit represented by the following general formula (1c), and a positive resist composition comprising the polymer as a base resin. There can be provided a positive resist composition having high sensitivity and high resolution on exposure to a high energy beam, wherein line edge roughness is reduced since swelling at the time of development is suppressed, and the residue after development is little

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