Organic anti-reflective coating composition and method for...

Details Organic anti-reflective coating composition and method for... Organic anti-reflective coating composition and method for...

2007-09-18

2007-09-18

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S319000, C430S349000, C430S434000, C430S494000

Reexamination Certificate

active

10979837

ABSTRACT:
An organic anti-reflective coating composition and a method for forming a photoresist pattern using the same in order to improve uniformity of the pattern in an ultra-fine pattern formation process of the photoresist. In one aspect, organic anti-reflective coating composition contains a light absorbent agent, a cross-linking agent, a thermal acid generator, and a formanilide photo-base generator.

REFERENCES:
patent: 6338934 (2002-01-01), Chen et al.
patent: 6395451 (2002-05-01), Jung et al.
patent: 2004/0076910 (2004-04-01), Rutter et al.
patent: 2005/0215713 (2005-09-01), Hessell et al.

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