Positive type photoresist composition

Details Positive type photoresist composition Positive type photoresist composition

2007-05-29

2007-05-29

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000

Reexamination Certificate

active

09729953

ABSTRACT:
A positive type photoresist composition suitable for light in the wavelength region of 170 nm to 220 nm, high in sensitivity, excellent in adhesion and giving a good resist pattern profile, which comprises a resin having an ester group represented by the following general formula [I] in its molecule and a compound generating an acid by irradiation of an active light ray or radiation:wherein R1represents a hydrogen atom, an alkyl group or a cycloalkyl group; and R2and R3, which may be the same or different, each represents a hydrogen atom, an alkyl group, a cycloalkyl group or -A-R4, and R2and R3may combine together to form a ring, wherein R4represents a hydrogen atom, an alkyl group or a cycloalkyl group, R4and R2or R3may combine together to form a ring, and A represents an oxygen atom or a sulfur atom.

REFERENCES:
patent: 5621019 (1997-04-01), Nakano et al.
patent: 5677405 (1997-10-01), Goodall et al.
patent: 5968713 (1999-10-01), Nozaki et al.
patent: 6013416 (2000-01-01), Nozaki et al.
patent: 6060207 (2000-05-01), Shida et al.
patent: 6150068 (2000-11-01), Sato et al.
patent: 6200725 (2001-03-01), Takechi et al.
patent: 6329125 (2001-12-01), Takechi et al.
patent: 6388101 (2002-05-01), Hada et al.
patent: 196 26 003 (1996-06-01), None
patent: 0 856 773 (1998-08-01), None
patent: 7-252324 (1995-10-01), None
patent: 8-82925 (1996-03-01), None
patent: 10-177247 (1998-06-01), None
patent: 10-207069 (1998-08-01), None
patent: 10-274852 (1998-10-01), None

Affiliated with

Also associated with

Rating

Positive type photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive type photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive type photoresist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3744850