Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

2007-05-15

2007-05-15

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S394000

Reexamination Certificate

active

10132001

ABSTRACT:
An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.

REFERENCES:
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5298365 (1994-03-01), Okamoto et al.
patent: 5367404 (1994-11-01), Hayata
patent: 5447810 (1995-09-01), Chen et al.
patent: 5621498 (1997-04-01), Inoue et al.
patent: 5691803 (1997-11-01), Song et al.
patent: 5985491 (1999-11-01), Kim et al.
patent: 6150059 (2000-11-01), Tanabe et al.
patent: 6355382 (2002-03-01), Yasuzato et al.
patent: 6361909 (2002-03-01), Gau et al.
patent: 6534242 (2003-03-01), Sugita et al.
patent: 6607535 (2003-08-01), Chan
patent: 2002/0177054 (2002-11-01), Saitoh et al.
patent: 0 464 492 (1992-01-01), None
patent: 0464492 (1992-01-01), None
patent: 589103 (1994-03-01), None
patent: 589103 (1994-03-01), None
patent: 0 915 384 (1999-05-01), None
patent: 0 939 343 (1999-09-01), None
patent: 969327 (2000-01-01), None
patent: 1 174 764 (2002-01-01), None
patent: 4-136854 (1992-05-01), None
patent: 5-036585 (1993-02-01), None
patent: 5-047628 (1993-02-01), None
patent: 5-217840 (1993-08-01), None
patent: A 06-163364 (1994-06-01), None
patent: 6-196388 (1994-07-01), None
patent: 06-267822 (1994-09-01), None
patent: A 11-135402 (1999-05-01), None
patent: 20003-310843 (2000-11-01), None
patent: 2001-005197 (2001-01-01), None
patent: A2002-90979 (2002-03-01), None
patent: A2002-122976 (2002-04-01), None
English translation of JP 6-196388.
English translation of claims 1, 3 and 8 of JP 4-136854.
English abstract of JP 5-036585.
English abstract of JP 5-047628.
English abstract of JP 5-217840.
English abstract of JP 2003-310843.
Communication from European Patent Office dated Feb. 18, 2004 for Application No. 02 722 748.7-1226.
English translation of Japanese Office action dated Dec.21, 2004 for Appl. No. 2002-123268.
English abstract of JPA 11-135402; and.
English abstract of JPA 06-163364.
An Office action from the Korean Patent Office dated Mar. 31, 2005 for Appl. No. 10-2002-7017663.
A Japanese version of the Korean Office action.
English translation of the Korean Office action.

Affiliated with

Also associated with

Rating

Exposure method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3739445