Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-07-17
2007-07-17
Garbowski, Leigh M. (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
10933192
ABSTRACT:
A method and system for reducing the computation time required to apply position-dependent corrections to lithography, usually mask, data is disclosed. Optical proximity or process corrections are determined for a few instances of a repeating cluster or object, usually at widely separated locations and then interpolating the corrections to the other instances of the repeating cluster based on their positions in the exposure field. Or, optical proximity corrections can be applied to the repeating cluster of objects for different values of flare intensity, or another parameter of patterning imperfection, such as by calculating the value of the flare at the location of each instance of the repeating cluster, and interpolating the optical proximity corrections to those values of flare.
REFERENCES:
patent: 5008553 (1991-04-01), Abe
patent: 6249904 (2001-06-01), Cobb
patent: 6289499 (2001-09-01), Rieger et al.
patent: 6301697 (2001-10-01), Cobb
patent: 6553559 (2003-04-01), Liebmann et al.
patent: 6560766 (2003-05-01), Pierrat et al.
patent: 6611953 (2003-08-01), Filseth et al.
patent: 6665856 (2003-12-01), Pierrat et al.
patent: 6668367 (2003-12-01), Cobb et al.
patent: 6735752 (2004-05-01), Manoo
patent: 6738859 (2004-05-01), Liebchen
patent: 6748578 (2004-06-01), Cobb
patent: 7010764 (2006-03-01), Pierrat
patent: 7026082 (2006-04-01), Eurlings et al.
patent: 7039896 (2006-05-01), Medvedeva et al.
patent: 2002/0073394 (2002-06-01), Milor et al.
patent: 2005/0160388 (2005-07-01), Cobb
patent: 2005/0257187 (2005-11-01), Gallatin et al.
patent: 2005/0273753 (2005-12-01), Sezginer
van de Kerkhof, Mark, et al., “Full Optical Column Characterization of DUV Lithographic Projection Tools,” SPIE Proc., vol. 5377, p. 1960-1970, SPIE, Bellingham, WA, 2004.
Joshi Devendra
Sezginer Abdurrahman
Zach Franz X.
Garbowski Leigh M.
Houston Eliseeva LLP
Invarium, Inc.
LandOfFree
Method for correcting position-dependent distortions in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for correcting position-dependent distortions in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for correcting position-dependent distortions in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3731705