Stimulus-sensitive composition, compound and pattern...

Details Stimulus-sensitive composition, compound and pattern... Stimulus-sensitive composition, compound and pattern...

2007-04-10

2007-04-10

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S921000, C430S325000, C430S326000, C430S907000, C568S075000

Reexamination Certificate

active

10893345

ABSTRACT:
A stimulus-sensitive composition comprising a compound (A) that generates one of an acid and a radical by external stimulation, the compound (A) having a specific structure.

REFERENCES:
patent: 6093753 (2000-07-01), Takahashi
patent: 2003/0215739 (2003-11-01), Harada et al.
patent: 2004/0185378 (2004-09-01), Kodama et al.
patent: 1 353 225 (2003-10-01), None
patent: 2000-292917 (2000-10-01), None
patent: 2001-187780 (2001-07-01), None
patent: 2001-294570 (2001-10-01), None
patent: 2002-236358 (2002-08-01), None
patent: 2002-255930 (2002-09-01), None
patent: 2002-265512 (2002-09-01), None
JPO English abstract for JP 2002-255930 (AOSO et al), provided by Japan Patent Office.
Machine-assisted English translation of JP 2002-236358 (Kodama et al) provided by JPO.
Machine-asssited English translation of JP 2001-187780 (Iwasa et al) provided by JPO.
Machine-assisted English translation of JP 2002-265512 (Uesugi et al) provided by JPO.
European Search Report dated Nov. 22, 2004.

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