Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1983-03-10
1985-09-17
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430280, 430281, 430288, 430521, 430523, 430905, 430907, 430910, 20415915, G03C 168, G03C 170, G03C 184
Patent
active
045420882
ABSTRACT:
There are disclosed a photopolymerizable composition comprising an organic solvent-soluble ethylenic unsaturated compound, an organic solvent-dispersible, water-insoluble granular dispersion and an organic solvent-soluble photopolymerization initiator having mutually dissolved or dispersed in a solvent composed mainly of an organic solvent, and an image-forming material using the composition.
According to this invention, there are provided a photopolymerizable composition which is developable with water in a short period of time, has high film strength and water resistance of a photosensitive layer, high lipophilic properties and superior film-forming capability and can produce a highly sensitive resist as well as an image-forming material using said composition.
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Derwent Publications-42000w/25-English Abstract of Japanese Publication 027462 (05/26/75).
Derwent Publications-63914b/35-English Abstract of Japanese Publication 158957 (07/20/79).
Derwent Publications-35699k/15-English Abstract of Japanese Publication 119332 (03/04/83).
Kojima Yasuo
Sasa Nobumasa
Hamilton Cynthia
Kittle John E.
Konishiroku Photo Industry Co,., Ltd.
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